Flame hydrolosis deposition photonics research

Référence de la vidéo 12543402
Flame hydrolosis deposition (FHD) photonics research. The FHD tool is used to deposit thin layers of silica to form waveguide structures for integrated photonic circuits. The system allows the precise doping of germanium, phosphorous and boron. The resulting silica films can be optimised for photosensitivity to allow direct UV laser writing of advanced photonic circuits. The films can be 2 to 50 microns in thickness. Applications include photonics devices for telecommunications, sensing in harsh environment such as aerospace and oil and gas industry, as well as novel applications in quantum technologies. These facilities are part of the clean rooms of the Zepler Institute at the University of Southampton, UK. The FHD system is being used for research by the Optoelectronics Research Centre (ORC).
Licence : Droits gérés
Crédit : Science Photo Library / Bell, Brian
Model Release : Non requis
Durée : 32 Secondes
Aspect ratio : 16/9
Restrictions : -

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